HISTORY

2016 Cymer Turns 30

2016 Cymer Turns 30

In January Cymer employees join founders Bob Akins and Rick Sandstrom in celebrating the company’s 30th Anniversary.

2015 Neon Reduction

New argon fluoride (ArF) immersion light source, the XLR® 700ix, released with improvements in bandwidth, wavelength and energy stability, enabling higher scanner throughput and process stability for advanced 14nm chip manufacturing and beyond.

2013

ASML acquired Cymer. The purpose of the acquisition is to accelerate the development of Extreme Ultraviolet (EUV) semiconductor lithography technology.

2012

SmartPulse™ data management tool for light source performance management is adopted by leading chipmakers around the world for improved process control and excursion prevention, improving cycle time and lowering costs.

2011

Cymer introduces OnPulse Plus™ and SmartPulse™ to provide chipmakers with data collection, reporting, and analysis tools. Eight EUV sources are built, five shipped to chipmakers, and four exposing wafers.

2010

The ELS-7010x is introduced, the world’s first field selectable 30W to 50W light source.

2009

The world’s first field-extendible power light source, the Cymer XLR® 600ix, is introduced. Continuing Moore’s Law, Cymer delivers first production-ready laser-produced plasma EUV source to a scanner manufacturer.

2008

Samsung names Cymer Supplier of the Year. Cymer receives prestigious Berthold Leibinger Innovationspreis Award for Advancement in Light Source Technology. XLR 500d light source for 32nm dry lithography unveiled. Cymer introduces High Performance Upgrades to existing product lines, allowing for light sources to extend their lifetimes. The XLA 105 HP is created.

2007

Cymer introduces the XLR® 600i, the first 90W ArF light source designed for high volume immersion production and double patterning lithography at 32nm and beyond. At the 2007 International EUVL Symposium, Cymer reveals that is has become the first company to reach the 100 Watt burst power EUV milestone. Cymer launches OnPulse®, a comprehensive approach to DUV light source productivity. GLX, Gas Lifetime eXtension, is introduced for the first time, reducing the downtime due to gas chamber refills.

2006

2006

Advancing DUV lithography further, the world’s first ArF light source for 45nm immersion production is released, the XLR 500i. Based on the dual chamber MOPA platform, XLR introduces Cymer Recirculating Ring Technology, a process that extends the life of the chambers.

2005

The Cymer XLA 300, the industry’s first 193nm ArF 6kHz light source, ships. The fifth-generation ArF light source, the Cymer XLA 400, launches. Another industry first: Cymer ships its 3000th production excimer light source.

2004

2004

Cymer launches the XLA 105 light source, a second-generation ArF light source featuring the MOPA platform. Cymer introduces its best-selling KrF light source, the ELS-7010, with 40W of output power for high-volume production at the 100nm production node and below. Later the same year the XLA 200, the world’s first excimer laser light source, is ready for 45nm immersion lithography.

2003

2003

Cymer China regional office opens. Cymer Korea Refurbish Center opens.

2002

2002

Cymer sets industry record with 2000 light sources shipped. Cymer’s NanoLith 7000 awarded Semiconductor International’s Editor’s Choice Best Product Award. KrF technology is extended down to sub-130nm with the ELS-7000. Cymer introduces MOPA (Master Oscillator Power Amplifier), the first dual-chamber technology with the XLA 100, delivering a light source with the lowest bandwidth and highest power in the industry.

2000

2000

Cymer launches the NanoLith™ 7000—the first production ArF light source designed for lithography applications at 193nm wavelengths. Cymer ELS-6000 light source receives Semiconductor International’s Editor’s Choice Best Product Award. The ELS-6010 is introduced for semiconductor production at 130nm node and below.

2001

2001

ELS-6010 receives Semiconductor International’s Editor’s Choice Best Product Award. Cymer launches Cymer OnLine, the industry’s first lithography light source-specific e-diagnostics and performance monitoring software.

1999

Cymer Southeast Asia, Ltd. (Taiwan) regional office opens.

1998

1998

Cymer wins Ernst & Young Regional Entrepreneur of the Year Award in High Technology. The ELS-5010 is introduced at 1kHz with power up to 15W. Later in the year the ELS-6000 is introduced at 2kHz and power of 20W. Global offices in Asia and Europe open: Cymer B.V., Cymer Korea, Inc., and Cymer Singapore Pte, Ltd.

1997

1997

Cymer research at 193nm leads to introduction of the ELX-5000A. Forbes cover story, “Laser Dudes”, features co-founders Bob Akins and Richard Sandstrom.

1996

Cymer goes public at $4.75/share (adjusted for a 2-for-1 stock split). Barron’s declares Cymer the IPO of the year. Shareholders who hold the company’s stock through the decade see their initial investment increase almost nine-fold. The first affordable personal digital assistant (PDA), the Palm Pilot (with Cymer patterned chips), becomes available to consumers. Cymer sells 145 laser systems, surpassing in one year the total number of lasers shipped in the previous decade. Cymer wins SEMI award for assisting development of the first DUV Excimer laser stepper.

1995

Cymer introduces solid-state pulse power module (SSPPM) technology in the ELS-4000F, the year’s most significant engineering development.

1991

1991

Cymer Japan offices open.

1988

Cymer CX-2LS named Semiconductor International’s Editor’s Choice Product of the Year.

1986

1986

Cymer, Inc. founded by Bob Akins and Richard Sandstrom.