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XLR 500i

XLR 500i

Related Files

Brochure - XLR 500
[ PDF 0.40 mb ]
Data Sheet - XLR 500i
[ PDF 1.40 mb ]
White Paper - XLR 500i
[ PDF 0.27 mb ]

Related Links

Animation - XLR 500i
Ring Technology Enabling 45nm Immersion Lithography

Product Overview

XLR 500i is the next generation photolithography light source. Built on the production proven XL Series platform, the XLR 500i is specifically design to meet the challenges of 45nm processing. The XLR 500i includes a new optical design called Ring Technology. Ring Technology – an abbreviation for “Recirculating Ring” – is a new dual chamber architecture designed to improve the dose stability delivered on wafer and to deliver this dose in a more cost effective way. Unlike previous light source architectures, Ring Technology addresses fundamental dose control performance and solves current cost of ownership limitations.

Features
  • Ring Technology
  • Longer Consumable Lifetimes
  • Standard E95 Metrology and Control
  • Production Proven Platform (XL Series)
Benefits
  • 1.5X improvement in dose control to enable superior CD control and yield
  • 20% lower Cost of Ownership (CoO)
  • Spectral performance measurement and control to minimize Optical Proximity Errors (OPE)
  • Reliable and upgradeable platform offering maximum availability with minimum risk

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