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XLR 600ix
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Flexible Light Source Enabling 32nm Double Patterning Lithography and Beyond
Product Overview
XLR 600ix is a 60/90W light source built on the production proven XL Series platform. It is based on the same Ring Technology as the XLR 500i and includes long pulse durations for longer optics life. Ring Technology – an abbreviation for “Recirculating Ring” – is the dual chamber architecture designed to improve the dose stability delivered on wafer. Unlike previous light source architectures, Ring Technology addresses fundamental dose control performance and solves current cost of ownership limitations.
The XLR 600ix has the added advantage of being selectable from 60 to 90W, providing an unprecedented level of flexibility in power management. For applications that require only 60W, the advanced Power Optics™ in the XLR 600ix result in a 2x increase in life time for those modules, further lowering the operating cost. The XLR 600ix also includes further advances in dose, bandwidth and wavelength stability, a key benefit for high power, high throughput applications. A XLR 500i can be upgraded to a XLR 600ix, providing extendibility to double patterning applications.
Features
- Ring Technology with Advanced Energy and Timing Control (ETC)
- Power Optics™
Benefits
- 3X improvement in energy stability to enable superior dose control and CD uniformity
- Lower Cost of Consumables (CoC)
- Spectral performance measurement and control to minimize Optical Proximity Errors (OPE)
- Improved focus stability
- High availability due to fewer gas refills
- Reliable platform offering maximum availability with minimum risk
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